This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Kae Takahashi: Innovator in Plasma Processing Technology
Introduction
Kae Takahashi is a prominent inventor based in Kurokawa, Japan. She has made significant contributions to the field of plasma processing technology. Her innovative work has led to the development of a unique plasma processing method that enhances the efficiency of semiconductor manufacturing.
Latest Patents
Kae Takahashi holds 1 patent for her invention titled "Plasma processing method and plasma processing system." This patent describes a plasma processing method performed in a plasma processing apparatus with a chamber. The method includes several steps: providing a substrate with a silicon-containing film and a mask film, supplying a processing gas that includes a tungsten-containing gas and a hydrogen fluoride gas, and forming a plasma from the processing gas to etch the silicon-containing film.
Career Highlights
Kae Takahashi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. Her role involves research and development in plasma processing technologies, where she applies her expertise to improve manufacturing processes.
Conclusion
Kae Takahashi's contributions to plasma processing technology exemplify her innovative spirit and dedication to advancing the semiconductor industry. Her work continues to influence the field and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile