Company Filing History:
Years Active: 2005
Title: Jürgen Honekamp: Innovator in Plasma-Aided Coating Technology
Introduction
Jürgen Honekamp is a notable inventor based in Hanau, Germany. He has made significant contributions to the field of plasma-aided coating technology. His innovative work has led to the development of a unique electrode arrangement that enhances the efficiency of coating substrates.
Latest Patents
Honekamp holds a patent for an electrode arrangement designed for the plasma-aided coating of a substrate. This arrangement allows for the application of a layer of material that comprises at least one first and a second material component. The patent details an anode arrangement that provides the first material component for evaporation and a cathode arrangement that supplies the second material component. Notably, the cathode material surface is divided into an evaporation-active part that supports the plasma discharge and an evaporation-inactive part that does not. This innovative design includes a motion-producing means to move the evaporation-inactive part, thereby reducing material deposits on the cathode surface.
Career Highlights
Honekamp is currently associated with Applied Films GmbH & Co. KG, where he continues to advance his research and development efforts. His work has been instrumental in improving plasma discharge techniques, which are crucial for various industrial applications.
Collaborations
Throughout his career, Honekamp has collaborated with esteemed colleagues such as Thomas Gebele and Jurgen Henrich. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Jürgen Honekamp's contributions to plasma-aided coating technology exemplify his commitment to innovation in the field. His patent and ongoing work at Applied Films GmbH & Co. KG highlight his role as a leading inventor in this specialized area.