Applied Films Gmbh & Co. Kg

Jürgen Honekamp

Stefan Bangert

Thomas Gebele

Helmut Grimm

Jürgen Ulrich

Elisabeth Budke

An electrode arrangement for the plasma-aided coating of a substrate () with a layer of material comprising at least one first and a second material component and for the production of a plasma discharge, more especially an arc discharge (), having an anode arrangement (), which provides the first material component at an anode material surface () for evaporation, and a cathode arrangement (), which provides the second material component at a cathode material surface (). The electrode arrangement is characterized in that the cathode material surface () is constituted by an evaporation-active part () supporting the plasma discharge () and an evaporation-inactive part () not supporting the plasma discharge. Preferably, a motion-producing means () is provided for moving the evaporation-inactive part () over the cathode material surface () in order to reduce deposit of material due to he first material component on the cathode material surface ().

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Hanau, Germany

Jürgen Honekamp