Hua-Lien, Taiwan

Jyh-Feng Lin


Average Co-Inventor Count = 3.6

ph-index = 5

Forward Citations = 64(Granted Patents)


Location History:

  • Hua-Lien County, TW (1999)
  • Hua-Lian, TW (1999)
  • Hua-Lien, TW (1996 - 2003)

Company Filing History:


Years Active: 1996-2003

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9 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Jyh-Feng Lin from Hua-Lien, Taiwan**

Introduction

Jyh-Feng Lin, an accomplished inventor based in Hua-Lien, Taiwan, has made significant contributions to the field of integrated circuit technology. With a total of 9 patents to his name, Lin is recognized for his innovative methods aimed at enhancing the performance and reliability of semiconductor devices.

Latest Patents

Among Lin's notable inventions is the **IMD oxide crack monitor pattern and design rule**. This groundbreaking method is designed to monitor and prevent irregularities in IMD oxide, particularly the occurrence of cracks. By inserting a monitoring pattern in the test line of the fabrication substrate, variations in the strength of the IMD oxide layer can be effectively detected. Additionally, Lin has developed design rules that help avoid layers of IMD oxide that are known to be susceptible to cracking.

Another significant patent is the **polysilicon load for 4T SRAM operating at cold temperatures**. This invention addresses the challenges associated with low doped polysilicon load resistors in NMOS based 4-transistor SRAM cells. To mitigate the excessive negative temperature coefficient of resistance (TCR), Lin introduced a novel PN junction approach. This method effectively increases the electrical thickness of polysilicon resistors at colder temperatures, thereby enhancing the reliability of SRAM devices when operating at low temperatures, as low as -45°C.

Career Highlights

Jyh-Feng Lin has worked with prominent organizations, including Taiwan Semiconductor Manufacturing Company Limited and the Industrial Technology Research Institute. His tenure at these companies has allowed him to hone his skills and contribute widely to the semiconductor industry, making him a key figure in advanced technology development.

Collaborations

Throughout his career, Lin has collaborated with esteemed colleagues such as Kuen-Joung Chuang and Ming-Chih Chung. These collaborations have fostered innovation and the sharing of expertise, which is essential in the rapidly evolving field of technology.

Conclusion

Jyh-Feng Lin's contributions to the world of innovations in semiconductor technology underscore his role as a pioneering inventor. With his extensive patent portfolio and collaborative efforts, Lin continues to drive advancements that benefit the industry and push the boundaries of what is possible in integrated circuit design. His work not only enhances device performance but also sets new standards for reliability in the face of challenging conditions.

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