Busan, South Korea

Juyoun Park

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignees: Koh Young Technology Inc., Korea Advanced Institute of Science and Technology. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Juyoun Park. Retrieved from https://idiyas.com/inventor/juyoun-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Juyoun Park: Innovator in Substrate Inspection Technology

Introduction

Juyoun Park is a notable inventor based in Busan, South Korea. He has made significant contributions to the field of substrate inspection technology, particularly through his innovative patent. His work focuses on improving the accuracy and efficiency of screen printing processes.

Latest Patents

Juyoun Park holds a patent for a "Substrate inspection apparatus and method of determining fault type of screen printer." This invention involves a substrate inspection apparatus that generates images indicating anomalies in solder pastes printed on substrates. The apparatus utilizes machine learning to determine fault types associated with these anomalies, enhancing the reliability of the printing process.

Career Highlights

Throughout his career, Juyoun Park has worked with prominent organizations such as Koh Young Technology Inc. and the Korea Advanced Institute of Science and Technology. His experience in these institutions has allowed him to refine his skills and contribute to advancements in technology.

Collaborations

Juyoun Park has collaborated with talented individuals in his field, including Jong Hwan Kim and Ye Won Hwang. These partnerships have fostered innovation and have been instrumental in the development of his patented technology.

Conclusion

Juyoun Park's contributions to substrate inspection technology exemplify his dedication to innovation. His patent and career achievements highlight the importance of advancements in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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