This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Junya Shinohara: Semiconductor Processing Invention
Introduction
Junya Shinohara is an inventor associated with Tokyo Electron Limited. His listed patent work concerns methods and equipment for processing semiconductor substrates.
Latest Patents
Shinohara is credited with 1 patent: “Substrate Processing Method and Substrate Processing Apparatus.” The invention describes removing a silicon oxide film from a silicon substrate using fluorine-containing and basic gases, followed by hydrogen treatment and thermal processing. It then uses a diluted germanium-containing gas for pre-cleaning before forming a silicon germanium film through epitaxial growth.
Career Highlights
Shinohara’s listed invention addresses several stages of substrate preparation and film formation, combining oxide removal, thermal treatment, pre-cleaning, and epitaxial growth. The patent is associated with Tokyo Electron Limited, a company active in semiconductor manufacturing equipment.
Collaborations
Tetsuji Ueno is identified as Shinohara’s coworker. The available information does not specify whether Ueno collaborated on this patent.
Conclusion
Junya Shinohara’s listed patent focuses on preparing silicon substrates for silicon germanium epitaxial growth, reflecting work in semiconductor processing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile