The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Mar. 07, 2025
Tokyo Electron Limited, Tokyo, JP;
Tetsuji Ueno, Yamanashi, JP;
Tomoya Hasegawa, Yamanashi, JP;
Shuntaro Takahashi, Yamanashi, JP;
Takuya Fukumoto, Yamanashi, JP;
Junya Shinohara, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing method includes: preparing a substrate in which a silicon oxide film is formed on a surface of a silicon substrate; supplying a fluorine containing gas and a basic gas to the substrate having the silicon oxide film to remove the silicon oxide film; supplying a hydrogen gas to the substrate in which the silicon oxide film is removed and applying a thermal treatment to the substrate; supplying a mixed gas of a germanium containing gas diluted with a hydrogen gas to the substrate to which the thermal treatment is applied to perform pre-cleaning of the substrate; and forming a silicon germanium film by epitaxial growth on the substrate to which the pre-cleaning is performed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile