Junting Liu-Norrod

Title: Junting Liu-Norrod: Innovator in Semiconductor Technology

Introduction

Junting Liu-Norrod is a prominent inventor based in Boise, ID (US). He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to forming crystalline semiconductor materials and transistors.

Latest Patents

Liu-Norrod's latest patents include methods of forming crystalline semiconductor material and methods of forming transistors. One of the key embodiments involves a method where a template is provided with a polycrystalline region along a surface. Semiconductor material is deposited under specific conditions that promote the growth of crystalline semiconductor structures from the grains of the polycrystalline region. This deposition occurs at a temperature of less than or equal to 500°C. Another embodiment focuses on forming a transistor, where the semiconductor material includes germanium, and the crystalline structures are doped to create a configuration with distinct portions. Insulative material is strategically placed adjacent to these portions, and a transistor gate is formed along the insulative material.

Career Highlights

Liu-Norrod is currently employed at Micron Technology Incorporated, where he continues to push the boundaries of semiconductor research and development. His work is instrumental in advancing technologies that are critical to modern electronics.

Collaborations

Some of his notable coworkers include Manuj Nahar and Darwin Franseda Fan, with whom he collaborates on various projects within the semiconductor field.

Conclusion

Junting Liu-Norrod's contributions to semiconductor technology through his innovative patents and work at Micron Technology Incorporated highlight his role as a key figure in the industry. His advancements in forming crystalline semiconductor materials and transistors are paving the way for future developments in electronics.