Wilton, CT, United States of America

Junqiang Zhou

This inventor holds 1 USPTO granted patent. Top assignee: Asml Holding N.v.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junqiang Zhou. Retrieved from https://idiyas.com/inventor/junqiang-zhou-381uno30

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Junqiang Zhou - Innovating Precision with Alignment Marks

Introduction:

Junqiang Zhou, a talented inventor based in Wilton, CT, has made significant contributions to the field of alignment systems with his groundbreaking patent.

Latest Patents:

Junqiang Zhou holds a crucial patent titled "Alignment mark for two-dimensional alignment in an alignment system," which focuses on determining the two-dimensional alignment position of a substrate. This patent introduces an innovative alignment mark comprising an array of patterns, including distinct first and second sets arranged in unique sequences along a defined direction.

Career Highlights:

Currently employed at ASML Holding N.V., Junqiang Zhou showcases his expertise in precision engineering and alignment technology. His dedication to advancing alignment systems has led to the development of cutting-edge solutions in the semiconductor industry.

Collaborations:

Throughout his career, Junqiang Zhou has collaborated closely with esteemed colleagues such as Gerrit Johannes Nijmeijer and Piotr Jan Meyer. Together, they have fostered a culture of innovation and excellence, driving forward the boundaries of alignment technology.

Conclusion:

Junqiang Zhou's inventive spirit and commitment to excellence highlight his instrumental role in reshaping the landscape of alignment systems. His groundbreaking patent stands as a testament to his unwavering dedication to precision engineering and technological advancement.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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