Shiga, Japan

Junki Ishimoto



Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 48(Granted Patents)


Location History:

  • Otsu, JP (2006)
  • Shiga, JP (2007 - 2013)

Company Filing History:


Years Active: 2006-2013

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5 patents (USPTO):

Title: Junki Ishimoto: Innovator in Polishing State Monitoring Technology

Introduction

Junki Ishimoto is a notable inventor based in Shiga, Japan, recognized for his contributions to polishing state monitoring technology. With a total of five patents to his name, Ishimoto has made significant advancements in the field of precision polishing.

Latest Patents

Ishimoto's latest patents include a sophisticated polishing state monitoring method. This innovative apparatus measures characteristic values of a workpiece's surface during polishing to determine the optimal timing for the polishing end point. The apparatus features a light-emitting unit that applies light to the workpiece's surface, a light-receiving unit that captures reflected light, and a spectroscope unit that divides the reflected light into various wavelengths. Additionally, it includes light-receiving elements that convert the detected light into electrical information. A spectral data generator processes this information to create spectral data, while a processor calculates the characteristic values based on the generated data.

Career Highlights

Throughout his career, Junki Ishimoto has worked with prominent companies such as Shimadzu Corporation and Ebara Corporation. His experience in these organizations has contributed to his expertise in developing advanced polishing technologies.

Collaborations

Ishimoto has collaborated with notable coworkers, including Yoichi Kobayashi and Shunsuke Nakai, who have also contributed to the field of polishing technology.

Conclusion

Junki Ishimoto's innovative work in polishing state monitoring technology has established him as a key figure in the industry. His patents reflect a commitment to enhancing precision in polishing processes, showcasing his significant impact on the field.

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