Junji Ishibashi

Title: Junji Ishibashi: Innovator in Plasma Processing Technology

Introduction

Junji Ishibashi is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 3 patents. His work focuses on developing advanced apparatuses and methods that enhance the efficiency of plasma processing.

Latest Patents

Ishibashi's latest patents include a plasma processing apparatus, a processing method, and an upper electrode structure. The plasma processing apparatus features a chamber with a lower electrode for substrate placement, an edge ring surrounding the lower electrode, and an upper electrode facing it. This innovative design includes a gas supply section that delivers process gas and a power supply that applies radio frequency power to generate plasma. The apparatus is designed to optimize the performance of plasma processing through a pulse modulation method, allowing for efficient switching of high-frequency power.

Career Highlights

Throughout his career, Junji Ishibashi has been associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has significantly impacted the development of plasma processing technologies, making him a key figure in this field.

Collaborations

Ishibashi has collaborated with notable colleagues, including Taichi Hirano and Ken Yoshida. Their combined expertise has contributed to advancements in plasma processing technology.

Conclusion

Junji Ishibashi's innovative work in plasma processing technology has established him as a prominent inventor in the industry. His patents reflect a commitment to enhancing the efficiency and effectiveness of plasma processing methods.