Company Filing History:
Years Active: 2009
Title: Junhui Oh: Innovator in Polishing Compositions
Introduction
Junhui Oh is a notable inventor based in Inuyama, Japan. He has made significant contributions to the field of polishing compositions, particularly in applications related to semiconductor devices. With a total of 2 patents, his work has garnered attention for its innovative approaches to enhancing polishing methods.
Latest Patents
Junhui Oh's latest patents include a polishing composition and a polishing method. The first patent describes a polishing composition that contains a deterioration inhibitor to maintain the polishing capability. This composition includes an abrasive and water, with the deterioration inhibitor being selected from polysaccharides and polyvinyl alcohol, with pullulan being a preferred choice. The abrasive is chosen from aluminum oxide and silicon dioxide, specifically fumed silica, fumed alumina, and colloidal silica. This composition is particularly useful for polishing in semiconductor device wiring.
The second patent also focuses on a polishing composition designed for semiconductor device wiring. It includes a specific surfactant, silicon oxide, and at least one component from carboxylic acid and alpha-amino acid. Additionally, it contains a corrosion inhibitor, an oxidant, and water. This innovative composition effectively suppresses the occurrence of dishing during the polishing process.
Career Highlights
Throughout his career, Junhui Oh has worked with prominent companies such as Fujimi Incorporated and Fujima Incorporated. His experience in these organizations has allowed him to refine his expertise in polishing technologies and contribute to advancements in the field.
Collaborations
Junhui Oh has collaborated with notable colleagues, including Tsuyoshi Matsuda and Tatsuhiko Hirano. These partnerships have facilitated the exchange of ideas and fostered innovation in their respective projects.
Conclusion
Junhui Oh's contributions to polishing compositions have made a significant impact in the semiconductor industry. His innovative patents reflect a deep understanding of materials and their applications, positioning him as a key figure in this technological domain.