Seoul, South Korea

Junghwan Moon

USPTO Granted Patents = 7 

Average Co-Inventor Count = 4.9

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021-2025

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7 patents (USPTO):

Title: **Junghwan Moon: Innovator in Semiconductor Lithography**

Introduction

Junghwan Moon, an accomplished inventor based in Seoul, South Korea, has made significant contributions to the field of semiconductor manufacturing. With a total of six patents to his name, his work focuses on advancing lithography methods through innovative simulations and manufacturing processes.

Latest Patents

Among his notable patents are advancements in lithography techniques, particularly a method that utilizes multi-scale simulation. This innovative method enables the selection of the best resist materials and involves creating a virtual resist pattern using sophisticated simulations. The process includes forming a test resist pattern through exposure on the selected resist and comparing it with the virtual pattern to ensure accuracy. When the error between the two patterns falls within an acceptable range, the resist pattern is then formed on the object to be patterned. Such methodologies enhance the efficiency and reliability of semiconductor device manufacturing.

Career Highlights

Junghwan Moon has had a distinguished career, holding positions at leading institutions such as Samsung Electronics and the Seoul National University R&D Foundation. His tenure at these organizations has contributed greatly to his expertise in semiconductor technologies, particularly in lithography and exposure equipment.

Collaborations

Throughout his career, Junghwan has collaborated with esteemed colleagues, including Junghoon Bak and Woojin Kim. These collaborations have further enriched his research and development efforts, allowing him to push the boundaries of semiconductor manufacturing techniques and achieve innovative patent outcomes.

Conclusion

In summary, Junghwan Moon stands out as a key inventor in the semiconductor industry, with his latest patents reflecting a deep understanding of lithographic processes and material simulations. His contributions not only enhance current manufacturing methodologies but also pave the way for future innovations in the field.

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