Company Filing History:
Years Active: 2016-2020
Title: Jungho Yoo: Innovator in Semiconductor Technology
Introduction
Jungho Yoo is a prominent inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.
Latest Patents
One of Jungho Yoo's latest patents involves semiconductor devices that include source/drain regions with multiple epitaxial patterns. This innovative semiconductor device features an active pattern protruding from a substrate, with a gate structure crossing over the active pattern. The source/drain regions are strategically placed on the active pattern at opposite sides of the gate structure. Each source/drain region consists of a first epitaxial pattern that contacts the active pattern and a second epitaxial pattern positioned on top of the first. The first epitaxial pattern is made from a material that shares the same lattice constant as the substrate, while the second epitaxial pattern utilizes a material with a greater lattice constant than that of the first.
Career Highlights
Jungho Yoo is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to push the boundaries of semiconductor innovation and contribute to the company's reputation for excellence in electronics.
Collaborations
Throughout his career, Jungho has collaborated with talented individuals such as Byeongchan Lee and Bonyoung Koo. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Jungho Yoo's contributions to semiconductor technology exemplify the spirit of innovation. His patents and work at Samsung Electronics Co., Ltd. highlight his commitment to advancing the field. His achievements will undoubtedly influence the future of semiconductor devices.