Cheonan, South Korea

JungHan Kim

This inventor holds 1 USPTO granted patent. Top assignee: Globalwafers Co., Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: JungHan Kim. Retrieved from https://idiyas.com/inventor/junghan-kim-j34qxgs3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Innovations of JungHan Kim in Silicon Wafer Technology.

Introduction

JungHan Kim is a notable inventor based in Cheonan, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the treatment of silicon wafers. His innovative methods aim to enhance the quality and performance of silicon materials used in various applications.

Latest Patents

JungHan Kim holds a patent for a method of treating a single crystal silicon ingot to improve the LLS ring/core pattern. This method is designed to reduce the size and density of defects in a single crystal silicon wafer. The process involves subjecting a single crystal silicon ingot to an anneal prior to wafer slicing, which ultimately leads to improved material quality.

Career Highlights

Currently, JungHan Kim is associated with GlobalWafers Co., Ltd., a leading company in the semiconductor industry. His work at GlobalWafers focuses on advancing silicon wafer technology and enhancing manufacturing processes. His expertise and innovative approaches have positioned him as a valuable asset in the field.

Collaborations

JungHan Kim collaborates with talented colleagues, including UiSung Jung and YoungJung Lee. Together, they work on various projects aimed at improving silicon wafer technology and addressing industry challenges.

Conclusion

JungHan Kim's contributions to silicon wafer technology through his innovative methods and collaborations highlight his importance in the semiconductor industry. His work continues to influence advancements in material quality and manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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