This inventor holds 1 USPTO granted patent. Top assignee: Varian Semiconductor Equipment Associates, Inc.. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: Innovations of Jung-Wook Park in Substrate Patterning
Introduction
Jung-Wook Park is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the area of substrate patterning. His innovative methods have the potential to enhance the efficiency and precision of semiconductor manufacturing processes.
Latest Patents
Jung-Wook Park holds a patent for a "Method and system for patterning a substrate." This patent describes a method that involves providing an array of resist features defined by a first pitch and a first gap width between adjacent resist features. The process includes introducing particles into the array of resist features, which causes the array to harden. The introduction of particles may lead to a reduction in the critical dimension of the resist features. Sidewalls are formed on the side portions of the hardened resist features. After the formation of these sidewalls, the hardened resist features are removed, leaving an array of isolated sidewalls on the substrate. This sidewall array serves as a mask for double patterning features in the substrate layers beneath, resulting in an array of features with a second pitch equal to half that of the first pitch.
Career Highlights
Jung-Wook Park is currently employed at Varian Semiconductor Equipment Associates, Inc. His work at this company has allowed him to develop and refine his innovative techniques in semiconductor manufacturing. His expertise in patterning methods has positioned him as a valuable asset in the industry.
Collaborations
Throughout his career, Jung-Wook Park has collaborated with notable colleagues, including Steven Carlson and Choong-Young Oh. These collaborations have contributed to the advancement of technology in the semiconductor field.
Conclusion
Jung-Wook Park's contributions to substrate patterning represent a significant advancement in semiconductor technology. His innovative methods and collaborative efforts continue to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile