Gyeonggi-do, South Korea

Jung-Ryul Ahn

This inventor holds 7 USPTO granted patents and 5 published patent applications. Top assignees: Skhynix Inc., Hynix Semiconductor Inc.. Active years: 2012-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jung-Ryul Ahn. Retrieved from https://idiyas.com/inventor/jung-ryul-ahn-qrwyevge

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 7 

% Patents Active = 85.7

Average Co-Inventor Count = 1.1

ph-index = 4

Forward Citations = 40(Granted Patents)


Location History:

  • Gyeonggi-do, KR (2012 - 2015)
  • Icheon-si, KR (2015 - 2016)

Company Filing History:


Years Active: 2012-2016

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7 patents (USPTO):Explore Patents

Title: Innovations of Jung-Ryul Ahn in Non-Volatile Memory Technology

Introduction

Jung-Ryul Ahn is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of non-volatile memory devices, holding a total of seven patents. His work focuses on innovative methods for fabricating memory devices that enhance performance and efficiency.

Latest Patents

One of his latest patents is titled "Non-volatile memory device and method for fabricating the same." This invention outlines a method for creating a non-volatile memory device that includes providing a substrate with a cell region for memory cells and a peripheral circuit region for circuit devices. The method involves forming memory cells stacked perpendicularly to the substrate and creating a first conductive layer that serves as a gate electrode for a selection transistor. This layer is simultaneously formed in the peripheral circuit region, functioning as a resistor body for at least one peripheral circuit device.

Another notable patent is "Non-volatile memory device with vertical memory cells and method for fabricating the same." This invention describes a non-volatile memory device featuring multiple gate electrodes stacked over a semiconductor substrate. The device includes junction layers with regions that protrude from the substrate and cross the gate electrodes, enhancing the overall functionality of the memory device.

Career Highlights

Jung-Ryul Ahn has worked with leading companies in the semiconductor industry, including SK Hynix Inc. and Hynix Semiconductor Inc. His experience in these organizations has allowed him to develop cutting-edge technologies in memory devices.

Collaborations

Throughout his career, Ahn has collaborated with notable professionals in the field, including Heung-Jae Cho and Yong-Soo Kim. These collaborations have contributed to the advancement of memory technology and innovation.

Conclusion

Jung-Ryul Ahn's contributions to non-volatile memory technology through his patents and collaborations highlight his role as a key innovator in the semiconductor industry. His work continues to influence the development of advanced memory devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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