The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8163617 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 24, 2012

Filed:

Jul. 08, 2010
Applicant:

Jung-ryul Ahn, Gyeonggi-do, KR;

Inventor:

Jung-Ryul Ahn, Gyeonggi-do, KR;

Assignee:

Hynix Semiconductor Inc., Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for fabricating a vertical channel type non-volatile memory device including forming a source region, alternately forming a plurality of interlayer dielectric layers and a plurality of conductive layers for a gate electrode over a substrate with the source region formed therein, forming a trench exposing the source region by etching the plurality of interlayer dielectric layers and the plurality of conductive layers for a gate electrode, and siliciding the conductive layers for a gate electrode and the source region that are exposed through the trench.


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Ahn, Jung-Ryul. (2012). Vertical channel type non-volatile memory device and method for fabricating the same (U.S. Patent No. 8163617). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8163617

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