Jung-Hsiang Chuang

Title: Innovations by Jung-Hsiang Chuang

Introduction

Jung-Hsiang Chuang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in inspection methods for wafers and devices under test (DUT). With a total of 3 patents to his name, Chuang's work has advanced the capabilities of semiconductor manufacturing.

Latest Patents

One of his latest patents is an "Inspection method for wafer or DUT." This method involves applying a voltage to a wafer or DUT, followed by illumination with an electron beam. The cathodoluminescent light emitted in response to the electron beam is detected, allowing for the determination of various characteristics of the wafer or DUT. Another significant patent is the "Wafer and DUT inspection apparatus and method using thereof." This apparatus includes a vacuum chamber, a stage, an electron gun, a lens system, an optical mirror, and a detector. The design facilitates effective inspection of wafers and DUTs, enhancing the precision of semiconductor manufacturing processes.

Career Highlights

Chuang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at TSMC has positioned him as a key player in the development of innovative inspection technologies.

Collaborations

Throughout his career, Chuang has collaborated with esteemed colleagues such as Bao-Hua Niu and David Hung-I Su. These collaborations have further enriched his contributions to the field.

Conclusion

Jung-Hsiang Chuang's innovative patents and contributions to semiconductor technology underscore his importance in the industry. His work continues to influence advancements in wafer and DUT inspection methods, showcasing the impact of his inventions on modern manufacturing processes.