Jung Hee Lee

Title: Innovations by Jung Hee Lee

Introduction

Jung Hee Lee is a notable inventor based in Incheon, South Korea. He has made significant contributions to the field of plasma processing and substrate support technologies. With a total of 2 patents, his work focuses on enhancing the efficiency and reliability of semiconductor manufacturing processes.

Latest Patents

Jung Hee Lee's latest patents include an "Apparatus for supporting substrate and plasma etching apparatus having the same." This invention provides a substrate supporting apparatus that can separately supply powers to both the central and edge regions of the substrate. It aims to improve the etching process by preventing damage to the center region of the semiconductor substrate while effectively removing layers or particles from the edge region. Another significant patent is the "Apparatus for plasma processing and method for plasma processing." This invention features a substrate supporter designed to securely hold substrates, such as wafers, while minimizing impurities on the rear surface. The plasma processing apparatus reduces the likelihood of arc discharges, thereby increasing process yield and product reliability.

Career Highlights

Jung Hee Lee is associated with Charm Engineering Co., Ltd., where he continues to innovate in the field of plasma processing technologies. His work has been instrumental in advancing the capabilities of semiconductor manufacturing equipment.

Collaborations

Jung Hee Lee collaborates with talented individuals such as Kwan Goo Rha and Kyung Ho Lee, who contribute to the development of cutting-edge technologies in their field.

Conclusion

Jung Hee Lee's contributions to plasma processing and substrate support technologies highlight his role as an influential inventor in the semiconductor industry. His innovative patents reflect a commitment to improving manufacturing processes and product reliability.