The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2015
Filed:
Apr. 01, 2008
Won Haeng Lee, Chungcheongnam-Do, KR;
Kwan Goo Rha, Gyeonggi-Do, KR;
Jung Hee Lee, Incheon, KR;
Chul Hee Jang, Gyeonggi-Do, KR;
Hyang Joo Lee, Gyeonggi-Do, KR;
Dong Wan Kim, Gyeonggi-Do, KR;
Won Haeng Lee, Chungcheongnam-Do, KR;
Kwan Goo Rha, Gyeonggi-Do, KR;
Jung Hee Lee, Incheon, KR;
Chul Hee Jang, Gyeonggi-Do, KR;
Hyang Joo Lee, Gyeonggi-Do, KR;
Dong Wan Kim, Gyeonggi-Do, KR;
Charm Engineering Co., Ltd., , KR;
Abstract
Provided are a substrate supporting apparatus and a plasma etching apparatus having the same. There is provided a substrate supporting apparatus that can separately provide powers to a central region and an edge region by disposing an electrode supporting a substrate at the central region of the substrate supporting apparatus, and disposing an electrode receiving radio frequency (RF) power at the edge region of the substrate supporting apparatus. There is provided a substrate edge etching apparatus having the substrate supporting apparatus for removing layers or particles deposited in an edge region of a semiconductor substrate and preventing damage of a center region of the semiconductor substrate during an etching process of the substrate edge.