Company Filing History:
Years Active: 2011-2015
Title: The Innovative Contributions of Kwan Goo Rha
Introduction
Kwan Goo Rha is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of plasma processing and substrate support technologies. With a total of four patents to his name, Rha's work has advanced the efficiency and reliability of semiconductor manufacturing processes.
Latest Patents
Rha's latest patents include an "Apparatus for Supporting Substrate and Plasma Etching Apparatus Having the Same." This invention provides a substrate supporting apparatus that can separately supply power to both the central and edge regions of the substrate. This design helps in removing layers or particles deposited in the edge region of a semiconductor substrate while preventing damage to the center region during the etching process. Another significant patent is the "Apparatus for Plasma Processing and Method for Plasma Processing." This invention features a substrate supporter that securely holds a substrate, such as a wafer, while effectively removing impurities from its rear surface. The plasma processing apparatus is designed to reduce the likelihood of arc discharges, thereby increasing process yield and product reliability.
Career Highlights
Throughout his career, Kwan Goo Rha has worked with prominent companies in the industry, including Charm Engineering Co., Ltd. and Micobiomed Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative technologies.
Collaborations
Rha has collaborated with several talented individuals in his field, including Jung Hee Lee and Kyung Ho Lee. These partnerships have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Kwan Goo Rha's contributions to the field of plasma processing and substrate support technologies have made a significant impact on semiconductor manufacturing. His innovative patents reflect his dedication to improving process efficiency and reliability.