Chul Hee Jang

Title: Chul Hee Jang: Innovator in Plasma Etching Technology

Introduction

Chul Hee Jang is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in plasma etching apparatuses. His innovative work has led to the development of advanced solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Chul Hee Jang holds a patent for an "Apparatus for supporting substrate and plasma etching apparatus having the same." This invention provides a substrate supporting apparatus that can separately supply powers to both the central and edge regions of a substrate. By positioning an electrode in the central region and another receiving radio frequency (RF) power at the edge, the apparatus effectively removes layers or particles from the edge of a semiconductor substrate. This design prevents damage to the center region during the etching process, showcasing Jang's commitment to improving semiconductor fabrication techniques. He has 1 patent to his name.

Career Highlights

Chul Hee Jang has been instrumental in advancing plasma etching technology through his work at Charm Engineering Co., Ltd. His expertise in the field has positioned him as a key player in the development of innovative solutions for the semiconductor industry. His contributions have not only enhanced manufacturing processes but have also paved the way for future advancements in semiconductor technology.

Collaborations

Chul Hee Jang has collaborated with notable colleagues, including Won Haeng Lee and Kwan Goo Rha. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the field.

Conclusion

Chul Hee Jang's contributions to plasma etching technology exemplify his dedication to innovation in the semiconductor industry. His patented inventions and collaborative efforts continue to influence advancements in manufacturing processes.