Company Filing History:
Years Active: 2000-2001
Title: Innovations of Jung-Hao Hsiue
Introduction
Jung-Hao Hsiue is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of measurement technology, particularly through his innovative patents. With a total of 2 patents, Hsiue has developed methods and apparatuses that enhance precision in measurement tasks.
Latest Patents
Hsiue's latest patents include a "Method and apparatus for measuring a gap" and an "Apparatus and method for measuring eccentricity between two circular members." The first patent describes a method that utilizes a dial gauge to measure gaps between opposing surfaces, achieving improved precision and eliminating human error. The apparatus consists of a mounting block, an extension arm, and a dial gauge, capable of measuring gap distances from about 0.01 mm to 10 mm. The second patent focuses on measuring the eccentricity between two circular members using a vernier measuring device. This innovative method allows for direct measurement and adjustment of robotic arms, enhancing automation processes.
Career Highlights
Jung-Hao Hsiue is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to apply his inventive skills in a practical setting, contributing to advancements in technology.
Collaborations
Hsiue has collaborated with notable colleagues such as Yung-Dar Chen and Shiuh-Sheng Chang. These partnerships have fostered a creative environment that encourages innovation and the development of new technologies.
Conclusion
Jung-Hao Hsiue's contributions to measurement technology through his patents demonstrate his commitment to innovation. His work not only enhances precision in measurements but also supports advancements in automation. Hsiue's inventions are a testament to the impact of dedicated inventors in the field of technology.