Nirasaki, Japan

Jun Yashiro


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 38(Granted Patents)


Location History:

  • Yokohama, JP (1996)
  • Nirasaki, JP (2012)

Company Filing History:


Years Active: 1996-2012

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3 patents (USPTO):Explore Patents

Title: Innovations of Jun Yashiro

Introduction

Jun Yashiro is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing, holding three patents that showcase his innovative approaches. His work primarily focuses on methods that enhance the efficiency and reliability of substrate processing.

Latest Patents

Yashiro's latest patents include a deposit removing method and a substrate processing method. The deposit removing method is designed to reliably eliminate deposits produced during plasma processing. This method utilizes plasma generated from a process gas that contains methane and oxygen. Following the plasma processing, a cleaning step is performed using a mixed gas that includes a fluorinated compound gas containing hydrogen.

The second patent, related to an etching method, outlines a process for etching a substrate with a layered structure. This method involves using a photoresist mask with a specific pattern, along with a silicon oxide coating film and an organic film. By depositing a layer on the photoresist mask using plasma from a hydrocarbon gas, the size of openings in the mask pattern can be narrowed. This technique ensures that the pattern is accurately transferred to the organic film, allowing for the creation of high aspect ratio openings while preventing pattern toppling.

Career Highlights

Jun Yashiro is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has been instrumental in advancing plasma processing technologies.

Collaborations

Yashiro collaborates with talented coworkers, including Shuji Moriya and Masahiro Ogasawara. Their combined expertise contributes to the innovative projects at Tokyo Electron Limited.

Conclusion

Jun Yashiro's contributions to plasma processing through his patents reflect his commitment to innovation in the field. His work continues to influence the development of advanced manufacturing techniques.

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