Sanda, Japan

Jun Tamura

This inventor holds 3 USPTO granted patents. Top assignee: Mitsubishi Materials Corporation. Active years: 1994-1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jun Tamura. Retrieved from https://idiyas.com/inventor/jun-tamura-jm9623ro

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 85(Granted Patents)


Company Filing History:


Years Active: 1994-1995

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3 patents (USPTO):Explore Patents

Title: Jun Tamura: Innovator in Sputtering Technology

Introduction

Jun Tamura is a notable inventor based in Sanda, Japan. He has made significant contributions to the field of sputtering technology, holding a total of 3 patents. His work primarily focuses on the development of advanced materials and manufacturing methods that enhance the performance of sputtering targets.

Latest Patents

Tamura's latest patents include innovative designs and methods for sputtering targets. One of his patents, titled "Sputtering target and method for manufacturing same," discloses a sputtering target that features a cylindrical backing member with a target material bonded to its outer surface through hot isostatic pressing. This method involves inserting the backing member into a mold, filling the space with target material, sealing the mold, and applying hot isostatic pressing to achieve a robust bond.

Another significant patent is related to "Target units," which describes a target unit comprising a basic body and a target layer made primarily of silicon alloy. This invention includes an interposed layer that enhances the adhesion between the basic body and the target layer, ensuring improved performance during sputtering applications.

Career Highlights

Jun Tamura is currently employed at Mitsubishi Materials Corporation, where he continues to innovate in the field of materials science. His work has been instrumental in advancing the technology used in sputtering applications, which are critical in various industries, including electronics and materials engineering.

Collaborations

Tamura has collaborated with several talented individuals in his field, including Munenori Mashima and Akifumi Mishima. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Jun Tamura's contributions to sputtering technology and his innovative patents reflect his dedication to advancing materials science. His work at Mitsubishi Materials Corporation and collaborations with fellow inventors highlight his role as a key player in this important field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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