The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 1995
Filed:
Feb. 19, 1992
Applicant:
Inventors:
Munenori Mashima, Sanda, JP;
Jun Tamura, Sanda, JP;
Assignee:
Mitsubishi Materials Corporation, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B22F / ;
U.S. Cl.
CPC ...
419-8 ; 419 49 ;
Abstract
A sputtering target is disclosed which includes a backing member of a cylindrical shape and a target material bonded onto an outer peripheral surface of the backing member by hot isostatic pressing. A method for manufacturing a sputtering target is also disclosed. First, a cylindrical backing member is inserted into a mold such that a space is defined between the backing member and the mold. A target material is then filled into the space between the backing member and the mold, and the mold is sealed. Thereafter, the target material and the backing member are subjected to hot isostatic pressing.