Uijeongbu-si, South Korea

Jun-soo Kim


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Incheon-si, KR (1999 - 2000)
  • Osan-si, KR (2007)
  • Uijeongbu-si, KR (2021 - 2023)

Company Filing History:


Years Active: 1999-2025

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6 patents (USPTO):Explore Patents

Title: Innovations of Jun-soo Kim in Semiconductor Technology

Introduction

Jun-soo Kim is a prominent inventor based in Uijeongbu-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of six patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

Among his latest patents, Jun-soo Kim has developed semiconductor devices that include innovative resistor structures. These devices feature a substrate with an upper surface that is perpendicular to a specified direction. The resistor structure consists of a first insulating layer on the substrate, a resistor layer on top of that layer, and a second insulating layer covering the resistor layer. A unique aspect of his design is the resistor contact, which penetrates both the second insulating layer and the resistor layer. The tilt angle of the side wall of the resistor contact varies according to its height from the substrate. This design results in a semiconductor device that boasts low contact resistance and minimal variation in contact resistance.

Career Highlights

Jun-soo Kim is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing devices that meet the growing demands of modern electronics.

Collaborations

He collaborates with talented colleagues, including Tae-Yeol Kim and Hyon-wook Ra, who contribute to the innovative projects at Samsung Electronics.

Conclusion

Jun-soo Kim's contributions to semiconductor technology exemplify the spirit of innovation in the industry. His patents reflect a commitment to improving device performance and efficiency, making a lasting impact on the field.

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