Hsin-Chu, Taiwan

Jun-Lung Huang


Average Co-Inventor Count = 6.7

ph-index = 2

Forward Citations = 25(Granted Patents)


Company Filing History:


Years Active: 2004-2006

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4 patents (USPTO):Explore Patents

Title: Innovations of Jun-Lung Huang in Semiconductor Technology

Introduction

Jun-Lung Huang is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving processes that enhance device performance and reliability.

Latest Patents

One of his latest patents is titled "Process for removing organic materials during formation of a metal interconnect." This invention discloses a method for removing organic material from an opening in a low k dielectric layer and above a metal layer on a substrate. The process involves applying an ozone water solution, which may include additives such as hydroxylamine or ammonium salts, either as a spray or through immersion. A chelating agent can be added to protect the metal layer from oxidation. Additionally, a diketone may be introduced to remove any metal oxide formed during the ozone treatment. This method effectively prevents changes in the dielectric constant and refractive index of the low k dielectric layer, thereby improving device performance.

Another notable patent is "Composite etching stop in semiconductor process integration." This patent describes a new method for forming a composite etching stop layer. The etching stop layer is deposited on a substrate and is selected from materials such as silicon carbide, silicon nitride, SiCN, SiOC, and SiOCN. A TEOS oxide layer is then deposited over the etching stop layer using plasma-enhanced chemical vapor deposition. This composite etching stop layer offers improved moisture resistance, better etching selectivity, and a lower dielectric constant compared to other etching stop layers.

Career Highlights

Jun-Lung Huang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative work has positioned him as a key figure in advancing semiconductor manufacturing processes.

Collaborations

He has collaborated with notable colleagues, including Yi-Chen Huang and Lain-Jong Li, contributing to various projects that enhance semiconductor technology.

Conclusion

Jun-Lung Huang's contributions to semiconductor technology through his patents and innovative methods have significantly impacted the industry. His work continues to pave the way for advancements in device performance and reliability.

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