Jun Ki Park

Title: Jun Ki Park and His Semiconductor Device Patents.

Introduction

Jun Ki Park is an inventor based in Suwon-si, South Korea, and is associated with Samsung Electronics. His patent work focuses on semiconductor device structures and fabrication, including source/drain contacts, epitaxial regions, and backside wiring. The supplied information lists 2 patents.

Latest Patents

**Semiconductor device.** This invention describes a semiconductor device with backside wiring and a fin-type pattern. A backside source/drain contact connects the wiring line to a source/drain pattern, using upper and lower conductive patterns. The upper pattern has a single conductive-film structure and fills at least part of a backside contact hole.

**Semiconductor device.** This invention describes a substrate with an active pattern and gate electrode, along with a source/drain pattern formed from lower and upper epitaxial regions. The upper epitaxial region includes a recess containing part of the lower epitaxial region. A source/drain contact extends into the substrate, and a contact silicide layer lies between the contact and source/drain pattern, touching the lower epitaxial region.

Career Highlights

Park’s listed inventions address semiconductor device architecture, with particular attention to contact formation and the arrangement of epitaxial and conductive structures. The supplied information identifies Samsung Electronics as his company.

Collaborations

Jeong Hyuk Yim is identified as Park’s coworker. The provided details do not specify a particular joint patent or collaboration between them.

Conclusion

Jun Ki Park’s listed patent work at Samsung Electronics concerns semiconductor structures designed around source/drain contacts, epitaxial regions, and backside wiring.