This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2002.
Company Filing History:
Years Active: 2002
Title: Jun-Kai Peng: Innovator in Semiconductor Technology
Introduction
Jun-Kai Peng is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work focuses on improving the etching process of semiconductor wafers, which is crucial for the manufacturing of electronic devices.
Latest Patents
Jun-Kai Peng holds a patent titled "Method for etching passivation layer of wafer." This patent describes an improved method for etching a groove in the uppermost layer of a semiconductor wafer. The process involves performing a conventional anisotropic etch to achieve a narrow groove, followed by an isotropic etch to widen the groove at the device surface. This technique rounds the edges where the walls of the groove meet the surface of the wafer. As a result, when a protective tape is applied to the device side of the wafer, the rounded edges are less likely to cut through the adhesive layer, preventing adhesive particles from remaining on the wafer surface when the tape is removed. Jun-Kai Peng has 1 patent to his name.
Career Highlights
Jun-Kai Peng is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to advancements in semiconductor manufacturing processes. His innovative approach to etching techniques has the potential to enhance the efficiency and quality of semiconductor devices.
Collaborations
Jun-Kai Peng has collaborated with notable colleagues in his field, including Wei-Kun Yeh and Chiarn-Lung Lee. These collaborations have likely fostered an environment of innovation and shared expertise, further advancing their collective work in semiconductor technology.
Conclusion
Jun-Kai Peng is a prominent inventor whose contributions to semiconductor technology are noteworthy. His innovative patent on etching methods demonstrates his commitment to improving manufacturing processes in the industry. His work continues to influence the development of advanced electronic devices.