The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2002
Filed:
Sep. 25, 1998
Applicant:
Inventors:
Assignee:
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1311 ;
U.S. Cl.
CPC ...
H01L 2/1311 ;
Abstract
In an improved method for etching a groove n the uppermost layer of a semiconductor wafer, a conventional anisotropic etch is performed to achieve a narrow groove and an isotropic etch is performed to widen the groove at the device surface and thereby round the edges where the walls of the groove meet the surface of the wafer. During a later step of applying a protective tape to the device side of the wafer to protect it during a step of grinding the back of the wafer, the rounded edges of the groove are unlikely to cut through the adhesive layer of the tape and thereby cause particles of adhesive to remain on the wafer surface when the tape is removes.