Jun-ing Gil

Title: Innovations of Jun-ing Gil in Semiconductor Manufacturing

Introduction

Jun-ing Gil is a prominent inventor based in Hwasung-gun, South Korea. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 5 patents. His work focuses on developing etching methods and compositions that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

One of Jun-ing Gil's latest patents involves an etchant used in the manufacture of semiconductor devices. This patent describes a nitride film etchant that is a water solution containing phosphoric acid (H₃PO₄) at a concentration of 50-70% by weight and hydrofluoric acid (HF). The etching method allows for the introduction of a wafer with a nitride film into a bathing tube containing the etchant, resulting in an increased etch rate of the nitride film while maintaining high selectivity between the nitride film and an oxide film. Another notable patent outlines a method of manufacturing semiconductor devices that includes forming a tungsten film on an insulating layer and spin-etching the tungsten film using a specific etching composition. This method minimizes the step-height of the intermediate insulating layer and ensures that the tungsten film is present only inside the contact holes.

Career Highlights

Jun-ing Gil is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the semiconductor field. His expertise in etching compositions and methods has positioned him as a key contributor to advancements in semiconductor technology.

Collaborations

Some of Jun-ing Gil's coworkers include Sang-moon Chon and Gyu-hwan Kwag, who collaborate with him on various projects within the semiconductor industry.

Conclusion

Jun-ing Gil's contributions to semiconductor manufacturing through his innovative patents and methods have significantly impacted the industry. His work continues to pave the way for advancements in semiconductor technology.