This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Micron Technology Incorporated. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Jun Ho Lee: Memory Word Line Structure Inventor
Introduction
Jun Ho Lee is an inventor associated with Higashihiroshima, Japan, and Micron Technology Incorporated. His patent work addresses memory-device architecture, particularly the structure of word lines and their oxide films.
Latest Patents
Lee is associated with 1 patent: “Apparatus Including Memory Word Line Structure.” The disclosed apparatus includes a word line array with multiple word lines extending through a memory mat. Two adjacent word lines have a contact on the first word line that is separated from the second word line by a gap. The word lines have a first oxide film in the array’s center area within the memory mat and a thicker second oxide film in the edge area outside the memory mat. This arrangement describes a structural approach to word-line design in a memory device.
Career Highlights
Lee’s listed patent is associated with Micron Technology Incorporated, a company whose work includes memory technologies. The patent focuses on the physical configuration of word lines and oxide films across different areas of a memory array.
Collaborations
Byung Yoon Kim is identified as Lee’s coworker. The provided information does not specify their roles or describe a particular joint project.
Conclusion
Jun Ho Lee’s patent documents an approach to memory word-line structure that distinguishes oxide-film thickness between the center and edge areas of an array.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
