Albany, NY, United States of America

Jun Hashimoto


Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Jun Hashimoto: Innovator in Plasma Etching Technology

Introduction

Jun Hashimoto is a prominent inventor based in Albany, NY (US). She has made significant contributions to the field of semiconductor manufacturing through her innovative work in plasma etching technology. With a focus on enhancing the efficiency and precision of semiconductor devices, her inventions have paved the way for advancements in this critical industry.

Latest Patents

Jun Hashimoto holds a patent for a plasma etching apparatus, plasma etching method, and semiconductor device manufacturing method. This invention provides a plasma etching apparatus designed to perform etching in a desirable shape. The apparatus includes a processing chamber for conducting plasma processes on a target substrate, a gas supply unit for introducing plasma processing gas, and a supporting table for the target substrate. Additionally, it features a microwave generator for plasma excitation, a plasma generation unit, a pressure control unit, and a bias power supply unit. The control unit manages the AC bias power by alternately supplying and stopping it, ensuring optimal performance during the etching process.

Career Highlights

Jun Hashimoto is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. Her work at the company has allowed her to apply her expertise in plasma etching technology, contributing to the development of advanced manufacturing solutions.

Collaborations

Throughout her career, Jun has collaborated with notable colleagues, including Toshihisa Nozawa and Masaru Sasaki. These collaborations have fostered an environment of innovation and have led to the successful development of cutting-edge technologies in the semiconductor field.

Conclusion

Jun Hashimoto's contributions to plasma etching technology exemplify her dedication to advancing semiconductor manufacturing. Her innovative patent and collaborative efforts highlight her role as a key player in the industry. Her work continues to influence the future of semiconductor device manufacturing.

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