Jun-Feng Lu

Title: Innovations of Jun-Feng Lu in Semiconductor Technology

Introduction

Jun-Feng Lu is a prominent inventor based in Shanghai, China, known for his significant contributions to semiconductor technology. With a total of four patents to his name, he has made remarkable advancements in the field, particularly in the development of methods that enhance the performance and reliability of semiconductor devices.

Latest Patents

Among his latest patents is the innovative method titled "Etch rate modulation of FinFET through high-temperature ion implantation." This method involves forming a plurality of fins extending from a buried oxide layer, with a masking layer placed atop each fin. The process includes performing a high-temperature ion implant to the semiconductor device, followed by an etch process that removes the masking layer without affecting the buried oxide layer. Another notable patent is the "Method for BEOL metal to dielectric adhesion," which promotes adhesion between a dielectric layer of a semiconductor device and a metal fill deposited within a trench. This method utilizes an ion implantation process where an ion beam is directed into the trench at an acute angle, forming an implantation layer in the trench's sidewall, ensuring that the metal fill adheres effectively.

Career Highlights

Jun-Feng Lu is currently employed at Applied Materials, Inc., a leading company in the semiconductor manufacturing equipment industry. His work at Applied Materials has allowed him to push the boundaries of semiconductor technology, contributing to advancements that are crucial for modern electronics.

Collaborations

Throughout his career, Jun-Feng has collaborated with notable colleagues, including Qintao Zhang and Scott Falk. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Jun-Feng Lu's contributions to semiconductor technology through his patents and work at Applied Materials, Inc. highlight his role as a key innovator in the industry. His methods for enhancing semiconductor device performance are paving the way for future advancements in electronics.