Juhee Yeo

Title: Innovations by Juhee Yeo: Pioneering Patents in Microelectronics

Introduction

Juhee Yeo is an accomplished inventor based in Suwon, South Korea. She has made significant contributions to the field of microelectronics, particularly through her innovative patents. With a total of four patents to her name, Yeo has established herself as a key figure in advancing technology in this sector.

Latest Patents

Juhee Yeo's latest patents include groundbreaking work on the selective removal of metal oxide hard masks. This invention focuses on compositions that facilitate the selective etching of metal oxide hard masks, such as zirconium oxide and hafnium oxide, which are commonly used in microelectronic devices. The process allows for the removal of these materials in the presence of other substances like polysilicon, silicon dioxide, silicon nitride, and tungsten. Another notable patent involves a nitride etchant composition and method, which provides effective solutions for selectively etching titanium nitride while leaving molybdenum and other materials unaffected. The compositions developed by Yeo achieve titanium nitride etch rates exceeding 3.5 Å/minute, ensuring uniform recess top and bottom layers in patterns.

Career Highlights

Juhee Yeo is currently employed at Entegris, Inc., where she continues to innovate and contribute to the field of microelectronics. Her work has garnered attention for its practical applications and effectiveness in enhancing device performance.

Collaborations

Throughout her career, Yeo has collaborated with talented individuals such as SeungHyun Chae and SeongJin Hong. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Juhee Yeo's contributions to microelectronics through her patents demonstrate her expertise and commitment to innovation. Her work not only advances the field but also sets a standard for future developments in technology.