Judith A Coffin

Title: Judith A. Coffin: Innovator in Semiconductor Fabrication and Material Science

Introduction

Judith A. Coffin is a notable inventor based in Pleasant Valley, NY (US). She has made significant contributions to the fields of semiconductor fabrication and material science. With a total of 2 patents to her name, her work has had a considerable impact on technology and engineering.

Latest Patents

Coffin's latest patents include a method for improved fabrication of salicide structures. This method involves preparing a semiconductor material for the formation of a silicide layer on selected areas. The process includes removing various films and particles from these areas to ensure optimal conditions for silicide formation. Another significant patent is her method to monitor Meta-Paete cure on metallized substrates. This innovative approach utilizes microreflectance infrared (IR) spectroscopy to determine the degree of cure of Meta-Paete films. The method allows for the quantification of ethanol evolution and can also assess the uniformity of the cure process.

Career Highlights

Judith A. Coffin has had a distinguished career at the International Business Machines Corporation (IBM). Her work has been instrumental in advancing semiconductor technologies and materials research. She has consistently demonstrated a commitment to innovation and excellence in her field.

Collaborations

Throughout her career, Coffin has collaborated with esteemed colleagues, including Kenneth John Giewont and Yun Yu Wang. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Judith A. Coffin is a pioneering inventor whose contributions to semiconductor fabrication and material science have made a lasting impact. Her innovative patents and collaborative efforts continue to influence the industry and inspire future advancements.