The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 1994
Filed:
Sep. 10, 1992
Lorraine P McDonnell Bushnell, Carmel, NY (US);
Judith A Coffin, Pleasant Valley, NY (US);
Guillermo Prada-Silva, Wappingers Falls, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Microreflectance infrared (IR) spectroscopy is used to determine the degree of cure of Meta-Paete (pyromellitic dianhydride-oxydianiline ethyl ester) films on metallized substrates. In this method, the infrared bands at 1028 and 1015 cm.sup.-1 are used to indirectly monitor ethanol evolution during Meta-Paete cure. The 1015 cm.sup.-1 band serves as internal reference, while the 1028 cm.sup.-1 band, which corresponds to the C--O stretch in the ethoxy group, is used to monitor imidization through loss of the ethoxy group during cure. Quantification of ethanol evolution is possible, since no apparent distortion is observed in the external reflection spectra at these two frequencies. The method can also be applied to measure the cure uniformity of Meta-Paete films, to provide an estimate of film thickness over metallized substrates, and to monitor temperature uniformity in an oven cavity.