Menlo Park, CA, United States of America

Jude A Dunne

This inventor holds 5 USPTO granted patents and 1 published patent application and 2 EPO patents. Top assignees: Honeywell International Inc., Alliedsignal Inc.. Active years: 2002-2004.

USPTO Granted Patents = 5 

% Patents Active = 60.0

 

Average Co-Inventor Count = 2.1

ph-index = 4

Forward Citations = 60(Granted Patents)


Company Filing History:


Years Active: 2002-2004

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5 patents (USPTO):Explore Patents

Title: Jude A Dunne: Innovator in Microelectronic Device Technology

Introduction

Jude A Dunne is a prominent inventor based in Menlo Park, CA (US), known for his significant contributions to the field of microelectronics. With a total of 5 patents, he has developed innovative methods that enhance the manufacturing processes of integrated circuits.

Latest Patents

One of his latest patents is a method for eliminating the reaction between photoresist and OSG. This method focuses on forming a microelectronic device while preventing photoresist poisoning. Various layers of conductive metals and dielectric materials are deposited onto a substrate in a selective sequence to create an integrated circuit. Vias and trenches are formed throughout the structure by exposing and patterning a photoresist material. The dielectric materials of the insulating layers are protected from the photoresist to prevent chemical reactions that lead to photoresist poisoning. This is achieved by forming a modified surface layer on the dielectric material through either depositing an additional layer that covers the dielectric material or modifying the exposed surface of the dielectric material using plasma or chemical treatment.

Another notable patent involves the process of using siloxane dielectric films in the integration of organic dielectric films in electronic devices. This invention relates to cured dielectric films and a process for their manufacture, which are useful in the production of integrated circuits. Dual-layered dielectric films are produced, where a lower layer comprises a non-silicon containing organic polymer and an upper layer consists of an organic, silicon-containing polymer. Such films are beneficial in the manufacture of microelectronic devices, including integrated circuits (ICs).

Career Highlights

Throughout his career, Jude A Dunne has worked with reputable companies such as Honeywell International Inc. and AlliedSignal Inc. His experience in these organizations has contributed to his expertise in microelectronic device technology.

Collaborations

Jude has collaborated with notable coworkers, including Brian J Daniels and Joseph T Kennedy, further enhancing his innovative work in the field.

Conclusion

Jude A Dunne's contributions to microelectronics through his patents and career experiences highlight his role as a key innovator in the industry. His work continues to influence the development of advanced technologies in integrated circuits.

Profile summary based on public USPTO records.
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