Santa Clara, CA, United States of America

Jr-Jyan Chen


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 44(Granted Patents)


Company Filing History:


Years Active: 2001-2003

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2 patents (USPTO):Explore Patents

Title: Jr-Jyan Chen: Innovator in Electrostatic Technology

Introduction

Jr-Jyan Chen is a notable inventor based in Santa Clara, CA, who has made significant contributions to the field of electrostatic technology. With a total of 2 patents, his work focuses on improving the efficiency and effectiveness of electrostatic chucks and cleaning processes in semiconductor manufacturing.

Latest Patents

Jr-Jyan Chen's latest patents include a method and apparatus for balancing an electrostatic force produced by an electrostatic chuck. This invention involves a bipolar electrostatic chuck that contains a chuck body with embedded electrodes, a primary power supply, and an offset power supply. The design allows for the balancing of the electrostatic force applied to a workpiece by adjusting the voltage supplied to the electrodes.

Another significant patent is related to a cleaning method for contact areas of semiconductor or metal regions on electronic device substrates. This two-step cleaning process utilizes fluorine-containing plasma followed by a hydrogen-containing gas atmosphere to effectively remove fluorine residues, enhancing the deposition of refractory metals and reducing electrical resistance.

Career Highlights

Jr-Jyan Chen is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His innovative work has contributed to advancements in manufacturing processes, particularly in the realm of electrostatic technology.

Collaborations

Throughout his career, Jr-Jyan Chen has collaborated with esteemed colleagues such as Barney M Cohen and Jingang Su, further enhancing the impact of his inventions in the industry.

Conclusion

Jr-Jyan Chen's contributions to electrostatic technology and semiconductor manufacturing demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in these processes, positioning him as a key figure in the field.

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