The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2003

Filed:

Nov. 01, 2002
Applicant:
Inventors:

David Loo, San Jose, CA (US);

Jr-Jyan Chen, Santa Clara, CA (US);

Kenny K. Ngan, Fremont, CA (US);

Bradley O. Stimson, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01G 3/00 ; H01H 3/00 ; H01T 2/300 ; H02B 2/300 ; H02H 2/300 ; H05F 2/300 ;
U.S. Cl.
CPC ...
H01G 3/00 ; H01H 3/00 ; H01T 2/300 ; H02B 2/300 ; H02H 2/300 ; H05F 2/300 ;
Abstract

A bipolar electrostatic chuck containing apparatus, and a concomitant method, for balancing an electrostatic force that the bipolar electrostatic chuck imparts upon a workpiece. More specifically, the bipolar electrostatic chuck contains a chuck body having a pair of electrodes embedded therein, a primary power supply and an offset power supply. Each electrode within the bipolar electrostatic chuck is respectively connected to a terminal on the primary power. Based upon a voltage produced by the primary power supply and a bias voltage of the workpiece, an offset voltage is applied by the offset power supply to one of the terminals, thus balancing the electrostatic force applied to the workpiece.


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