San Jose, CA, United States of America

David H Loo

USPTO Granted Patents = 5 

Average Co-Inventor Count = 2.7

ph-index = 4

Forward Citations = 47(Granted Patents)


Company Filing History:


Years Active: 1998-2017

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5 patents (USPTO):Explore Patents

Title: David H. Loo: Innovator in Plasma Cleaning Technologies

Introduction

David H. Loo is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of plasma cleaning technologies with a focus on improving deposition processes in manufacturing. With a remarkable portfolio of five patents, Loo continues to push the boundaries of innovation in his industry.

Latest Patents

Among his latest patents is a groundbreaking invention titled "In situ plasma clean for removal of residue from pedestal surface without breaking vacuum." This invention presents methods and apparatus for effectively plasma cleaning a deposition chamber without the need to break vacuum. The process involves positioning a substrate on a susceptor situated in the chamber, which is surrounded by an electrically floating deposition ring. It includes the steps of depositing a metal film on both the substrate and the deposition ring, grounding the metal film on the deposition ring, and employing plasma to remove contaminants without resputtering the grounded metal film. This innovation greatly enhances efficiency in semiconductor manufacturing processes.

Career Highlights

David Loo is currently affiliated with Applied Materials, Inc., a leading company in the field of materials engineering. His work at Applied Materials has enabled him to develop solutions that address complex challenges in the semiconductor fabrication industry. Loo's inventions not only improve operational efficiency but also contribute to the sustainability of manufacturing processes.

Collaborations

Throughout his career, David has collaborated with notable colleagues such as Richard J. Green and Cheng-Hsiung Matt Tsai. These partnerships have fostered a creative environment that has led to the successful development of innovative technologies within the realm of plasma cleaning and deposition processes.

Conclusion

David H. Loo's contributions to the field of plasma cleaning technologies underscore his status as a significant inventor in the industry. With a focus on enhancing efficiency and sustainability in semiconductor manufacturing, Loo's work exemplifies the importance of innovation in driving technological advancements. His continued collaboration with talented professionals and dedication to research positions him at the forefront of his field.

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