Austin, TX, United States of America

Joseph LaTorre


Average Co-Inventor Count = 3.6

ph-index = 5

Forward Citations = 141(Granted Patents)


Company Filing History:


Years Active: 1992-1996

where 'Filed Patents' based on already Granted Patents

7 patents (USPTO):

Title: Joseph LaTorre: Innovative Mind Behind Advanced Photoresist Technologies

Introduction

Joseph LaTorre is an accomplished inventor based in Austin, TX, with a notable history of innovation that encompasses seven patents to his name. His work primarily focuses on advancing photoresist technologies, playing a significant role in the field of semiconductor manufacturing. Through his inventive contributions, LaTorre has enhanced the capabilities and applications of photoresist materials, making them more efficient and versatile.

Latest Patents

Joseph LaTorre's latest patents showcase his expertise in positive photoresist compositions. One of his innovations is a positive acting photoresist that comprises a film forming reactive polymer, an iodonium initiator, or a non-ionic compound that generates triflic acid upon exposure to radiation. Additionally, this composition includes a multifunctional organic carboxylic acid. This invention represents a significant improvement in the photoresist technology landscape and has impactful applications in various industries concerned with precision patterning.

Career Highlights

LaTorre currently serves as an inventor at International Business Machines Corporation (IBM), where he continues to develop cutting-edge solutions for the semiconductor industry. His extensive patent portfolio reflects his commitment to research and development in this competitive field, and he has made substantial contributions to enhancing manufacturing processes and material formulations. Throughout his career, he has demonstrated an extraordinary ability to merge theoretical knowledge with practical applications.

Collaborations

Throughout his professional journey, Joseph LaTorre has collaborated with various talented individuals, including his coworkers Burton Jesse Carpenter and Michael G McMaster. These collaborations have fostered an environment of innovation and creativity, enabling them to collectively push the boundaries of what is possible in the field of photoresist technology.

Conclusion

Joseph LaTorre’s contributions to the world of inventions and innovations in photoresist compositions place him among the notable inventors of his time. His work at IBM and his valuable patents reflect a deep commitment to advancing technology and meeting the ever-evolving needs of the semiconductor industry. As he continues to innovate, LaTorre remains a key figure in shaping the future of this essential technology.

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