The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 1993
Filed:
Sep. 17, 1991
Robert D Allen, San Jose, CA (US);
William R Brunsvold, Poughkeepsie, NY (US);
Burton J Carpenter, Austin, TX (US);
William D Hinsberg, Fremont, CA (US);
Joseph LaTorre, Austin, TX (US);
Michael G McMaster, Austin, TX (US);
Melvin W Montgomery, New Windsor, NY (US);
Wayne M Moreau, Wappinger, NY (US);
Logan L Simpson, Binghampton, NY (US);
Robert J Tweig, San Jose, CA (US);
Gregory M Wallraff, Morgan Hill, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Disclosed is a positive photoresist. The photoresist has as its polymeric component a substantially water and base insoluble, photolabile polymer. The photoresist further includes a photo acid generator that is capable of forming a strong acid. This photo acid generator may be a sulfonate ester derived from a N-hydroxyamide, or a N-hydroxyimide. Finally, the photoresist composition includes an appropriate photosensitizer.