Company Filing History:
Years Active: 1993
Title: The Innovations of Robert J Tweig
Introduction
Robert J Tweig is a notable inventor based in San Jose, CA. He has made significant contributions to the field of photoresist technology, particularly in the development of a positive photoresist system for near-UV to visible imaging. His work has implications for various applications in the semiconductor industry.
Latest Patents
Robert J Tweig holds 1 patent for his invention titled "Positive photoresist system for near-UV to visible imaging." This patent discloses a positive photoresist that includes a polymeric component which is substantially water and base insoluble, along with a photolabile polymer. The composition also features a photo acid generator capable of forming a strong acid, which may be a sulfonate ester derived from a N-hydroxyamide or a N-hydroxyimide. Additionally, the photoresist includes an appropriate photosensitizer.
Career Highlights
Robert J Tweig is associated with International Business Machines Corporation, commonly known as IBM. His role at IBM has allowed him to work on cutting-edge technologies and contribute to advancements in the field of imaging systems.
Collaborations
Throughout his career, Robert has collaborated with notable colleagues such as Robert David Allen and William R Brunsvold. These collaborations have likely enriched his work and led to further innovations in the industry.
Conclusion
Robert J Tweig's contributions to photoresist technology exemplify the importance of innovation in the semiconductor field. His patent and work at IBM highlight his role as a significant inventor in this area.