International Business Machines Corporation

Joseph LaTorre

Burton Jesse Carpenter

Logan L Simpson

Michael G McMaster

Richard Francis Frankeny

Ronald L Imken

Robert David Allen

Wayne Martin Moreau

Gregory Michael Wallraff

William R Brunsvold

Karl Hermann

Jerome A Frankeny

William D Hinsberg, Iii

Melvin W Montgomery

Robert J Tweig

A positive acting photoresist comprising a film forming reactive polymer; an iodonium initiator or a non-ionic compound that generates triflic acid upon exposure to radiation; and a multifunctional organic carboxylic acid is provided as well as use thereof.

Positive photoresist composition containing photoacid generator and use

A method of fabricating a substrate module is provided that includes cavities of a diameter and depth which take into account the statistical variance in the dimensions of C4 solder balls. By constructing cavities with the proper dimensions, electrical connection between the chip and substrate, via the solder balls, can be ensured. Further, an annular shoulder is provided which acts as a positive stop to prevent any over travel of the C4s within the cavity, thereby allowing a great deal more pressure to be applied to seat the chip than possible with conventional methods. The present invention also provides processes for applying a coating of material onto the substrate which acts as an adhesive and sealant. This material is provided intermediate any of the holes or cavities (vias) which may be contained within the substrate, and is not deposited in these vias such that no interference is encountered when attaching the chip by way of the C4 solder balls thereon. Chips, or additional substrate layers are then placed onto the substrate, thereby forming a sealed integrated circuit module, which has adhesive between the chip and carrier layers.

Chip attach and sealing method

Disclosed is a positive photoresist. The photoresist has as its polymeric component a substantially water and base insoluble, photolabile polymer. The photoresist further includes a photo acid generator that is capable of forming a strong acid. This photo acid generator may be a sulfonate ester derived from a N-hydroxyamide, or a N-hydroxyimide. Finally, the photoresist composition includes an appropriate photosensitizer.

Positive photoresist system for near-UV to visible imaging

A method and composition are shown for producing a positive-acting photoimagible epoxy resin. In addition to the epoxy resin, the compositions include a dual component cross-linking system which combines a basic curing agent with an onium or arylonium salt. The onium or arylonium salt produces a protic acid upon exposure to irradiation causing a reaction with the basic curing agent which renders the agent ineffective as an epoxy curing agent during subsequent heating. During a subsequent bake operation, only the unexposed regions of the epoxy will cross-link. As a result, the exposed areas wash away, leaving only the cured reverse image.

Method and composition for obtaining image reversal in epoxy

A method and system are provided for forming apertures in the dielectric layers of an aluminum circuit to allow electrical connection to the aluminum core and enhance the thermal efficiency of integrated circuit devices attached thereto. Specifically, the apertures are formed to accommodate the ICs and allow them to be in direct contact with the aluminum core layer of the circuit card. The apertures are formed by placing a photoresist material on the aluminum core in locations corresponding to the desired locations of the aperture. The photoresist material is used as a 'placeholder' during subsequent processing. The aluminum is then anodized to form aluminum oxide and a polymer material is then electrophoretically placed over the aluminum oxide. The photoresist 'placeholder' is then removed, leaving an aperture that will accommodate an IC. The top of the polymer layer can then be circuitized to interconnect the chips.

Aperture formation in aluminum circuit card for enhanced thermal

Substrate layers with individual bumps and cavities are provided which can be manufactured and tested in parallel and then joined into a multilayer substrate. The method of manufacturing these layers, as contemplated by the present invention, includes initially forming a plurality of vias in a layer of electrically conductive material. Next, a dielectric material, is placed adjacent the layer of conductive material. Holes which are coaxial with the vias are then formed in the dielectric material. Electrically conductive material is then deposited within the vias, thereby forming a conductive stud. Additional electrically conductive material is then deposited, on the side of the dielectric opposite the conductive material to form a signal layer, as well projections of electrically conductive material extending from the studs. A continuous layer of dielectric material is then placed adjacent the side of the substrate opposite the projections. A portion of this layer, adjacent the stud, is then removed, thereby exposing the stud and forming a cavity. The substrate layers can then be joined to form a multilayer substrate module.

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Austin, TX, United States of America

Joseph LaTorre