Apalachin, NY, United States of America

Joseph G Ameen

This inventor holds 22 USPTO granted patents, primarily in Electrochemical Polishing. Top assignees: International Business Machines Corporation, W. L. Gore & Associates, Inc., Rohm and Haas Electronic Materials Cmp Holdings, Inc.. Active years: 1978-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joseph G Ameen. Retrieved from https://idiyas.com/inventor/joseph-g-ameen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 90.9

Average Co-Inventor Count = 3.0

ph-index = 12

Forward Citations = 675(Granted Patents)


Location History:

  • Apalachin, NY (US) (1978 - 1994)
  • Bear, DE (US) (1996)
  • Newark, DE (US) (1997 - 2010)

Company Filing History:


Years Active: 1978-2010

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Areas of Expertise:
Electrochemical Polishing
Polishing Pad
Circuit Board
Pluggable Tab Module
Thermally Conductive Adhesive
Multilayered Flexible Circuit
Thin Film Electronic Device
Solder Application
Ozone Safe Stripping
Epoxy Composition
Strippable Solder Mask
Silicon Oil Thermal Grease
22 patents (USPTO):Explore Patents

Title: Joseph G. Ameen: Innovator in Electrochemical Mechanical Polishing

Introduction

Joseph G. Ameen is a distinguished inventor based in Apalachin, New York, with a notable portfolio consisting of 22 patents. His work is primarily focused on innovations in the field of electrochemical mechanical polishing, contributing significantly to advancements in manufacturing and material processing technologies.

Latest Patents

Among his latest inventions, Joseph Ameen has developed methods and tools for electrochemical mechanical polishing. His patent titled "Method for Electrochemical Mechanical Polishing" presents a unique process involving a polishing pad with a cellular polymeric layer atop a conductive substrate. This innovative approach features a layer thickness of less than 1.5 mm, equipped with pores that are strategically designed to vary in diameter from the polishing surface to the conductive substrate. Another significant patent is the "Polishing Pad for Electrochemical Mechanical Polishing," which describes a similar cellular polymeric layer overlying a conductive substrate, reinforcing the effectiveness of this advanced polishing technique.

Career Highlights

Joseph Ameen has built an impressive career working with esteemed organizations in the industry. While he has contributed his expertise at International Business Machines Corporation (IBM) and W. L. Gore & Associates, Inc., his work has not only led to technological innovation but has also significantly influenced his field.

Collaborations

Throughout his career, Joseph has collaborated with notable peers, including Joseph Funari and David W. Sissenstein, Jr. These partnerships have enhanced his innovative capabilities and allowed for the advancement of technologies in his area of expertise.

Conclusion

Joseph G. Ameen’s contributions to the field of electrochemical mechanical polishing exemplify the spirit of innovation. With 22 patents to his name, his work continues to impact various industries, reflecting the significant role of inventors in shaping technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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