Company Filing History:
Years Active: 2011-2014
Title: Innovations by Joseph E. Gortych
Introduction
Joseph E. Gortych is an accomplished inventor based in Sarasota, Florida. He has made significant contributions to the field of imaging technology, particularly in the development of systems and methods for forming time-averaged line images. With a total of three patents to his name, Gortych's work has implications for various applications, including semiconductor manufacturing.
Latest Patents
Gortych's latest patents focus on systems and methods for forming a time-averaged line image. One of his notable inventions involves creating a line image with a first amount of intensity non-uniformity. The method includes forming a secondary image that overlaps the primary image and scanning it to produce a time-averaged modified line image. This innovation aims to reduce intensity non-uniformity, thereby enhancing the quality of the imaging process. Additionally, his work on laser annealing for semiconductor wafers emphasizes increasing throughput by minimizing line-image overlap during scans.
Career Highlights
Joseph E. Gortych is currently associated with Ultratech, Inc., where he continues to push the boundaries of imaging technology. His expertise in developing advanced imaging systems has positioned him as a key player in the industry. Gortych's innovative approaches have not only advanced the technology but have also contributed to the efficiency of semiconductor manufacturing processes.
Collaborations
Gortych has collaborated with notable colleagues, including Serguei Anikitchev and James McWhirter. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Joseph E. Gortych's contributions to imaging technology through his patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in semiconductor manufacturing and imaging systems.