This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2008.
Company Filing History:
Years Active: 2008
Title: Joseph E Brandenburg: Innovator in Photolithography Mask Correction
Introduction
Joseph E Brandenburg is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of photolithography. His innovative approach has led to the development of a unique correction process for photolithography masks.
Latest Patents
Brandenburg holds 1 patent for his invention titled "Process window-based correction for photolithography masks." This patent describes a method for correcting photolithography masks used in semiconductor and micro electromechanical systems. The correction is based on process windows, which allows for improved accuracy in the manufacturing process. The invention involves evaluating segments of an idealized photolithography mask at various process variable values to estimate different photoresist edge positions. By comparing these estimated edge positions to a minimum critical dimension, the method ensures that the segments are adjusted accordingly if they do not meet the required specifications.
Career Highlights
Brandenburg is currently employed at Intel Corporation, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the efficiency and precision of photolithography processes, which are crucial for the production of microchips and other electronic components.
Collaborations
Throughout his career, Brandenburg has collaborated with talented professionals in the field, including Robert M Bigwood and Shem Ogadhoh. These collaborations have fostered an environment of innovation and have contributed to the success of various projects within the semiconductor industry.
Conclusion
Joseph E Brandenburg's contributions to photolithography mask correction exemplify the importance of innovation in semiconductor technology. His work not only enhances manufacturing processes but also paves the way for future advancements in the field.
